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Next generation digital molecular sensing capabilities purpose fit for process control
Traditional methods of metrology are insufficient for advanced semiconductor manufacturing. Optical Emission Spectroscopy (OES) methods lack the precision needed, and traditional Residual Gas Analysis (RGA) lack the durability to withstand the harsh, corrosive gas environments required by advanced semiconductor manufacturing processes.
With Atonarp’s robust miniature mass spectrometer and proprietary software platform we’ve created a unique solution. We deliver accurate in-situ measurements, all within small, self-contained instruments, which are purpose built to withstand the rigors of advanced semiconductor manufacturing environments.
Digital molecular analysis takes metrology for semiconductor manufacturing to the next level
Our semiconductor metrology products prioritize durability, with innovations to protect against damage to the sensors, and unique cleaning processes that can remove particulate buildup on the sensor which can negatively affect sensitivity.
Designed with ease of integration in mind, our products are plug and play ready. Their small footprint, combined with built in high-speed interfaces complete with a variety of industry standard protocol options, ensure the ability to fully integrate into any process tool or equipment control system.
Cloud connected and powered by innovative electronics and signal processing technology, our products provide high speed, high resolution measurements --providing actionable process insights.
Digital molecular analysis takes metrology for semiconductor manufacturing to the next level
Our semiconductor metrology products prioritize durability, with innovations to protect against damage to the sensors, and unique cleaning processes that can remove particulate buildup on the sensor which can negatively affect sensitivity.
Designed with ease of integration in mind, our products are plug and play ready. Their small footprint, combined with built in high-speed interfaces complete with a variety of industry standard protocol options, ensure the ability to fully integrate into any process tool or equipment control system.
Cloud connected and powered by innovative electronics and signal processing technology, our products provide high speed, high resolution measurements --providing actionable process insights.
Building on our break through technologies for sensing and understanding molecular information, our team of experts is innovating new solutions across the life sciences, semiconductor manufacturing, and industrial process control.
Atonarp’s revolutionary optical spectroscopy platform for molecular diagnostics.
Chamber Cleaning, Seasoning, Fingerprinting & Matching
Chamber clean end point detection, fingerprinting & seasoning (matching) within <1σ of a golden chamber
Accurate reactant partial pressures for CVD/ALD/ALE; critical for copy exact process duplication
Quantify contamination, gas impurities & chemistry inside the process chamber with ppb sensitivity
Machine learning in semiconductor FABs is a multi $B efficiency opportunity.
Tighter process control gives higher line and product yield, higher throughput, and optimized maintenance schedules
Aston’s measured in-situ real-time data at the molecular level gives true insight and is quantified, actionable data for ML models
Aston delivers metrology requirements for HAR etch, small OA% and selective processing for gate all around and 3D memory structures.
High sensitivity for low Open Area (OA), 0.3%, and High Aspect Ratio (HAR)
No plasma or pulsed plasma? No problem!
Metrology of structures beyond line-of-sight
CopyExactly! has matured.
Equipment and Process Co-Optimization (EPCO) requires molecular level fingerprinting, profiling and matching; not just the same recipe on the same equipment.
Tightly controlled, autonomous low level process and chamber management is the new gold standard, to exactly match the transfer source with molecular precision.
Building on our break through technologies for sensing and understanding molecular information, our team of experts is innovating new solutions across the life sciences, semiconductor manufacturing, and industrial process control.
Chamber Cleaning, Seasoning, Fingerprinting & Matching
Chamber clean end point detection, fingerprinting & seasoning (matching) within <1σ of a golden chamber
Accurate reactant partial pressures for CVD/ALD/ALE; critical for copy exact process duplication
Quantify contamination, gas impurities & chemistry inside the process chamber with ppb sensitivity
Machine learning in semiconductor FABs is a multi $B efficiency opportunity.
Tighter process control gives higher line and product yield, higher throughput, and optimized maintenance schedules
Aston’s measured in-situ real-time data at the molecular level gives true insight and is quantified, actionable data for ML models
Aston delivers metrology requirements for HAR etch, small OA% and selective processing for gate all around and 3D memory structures.
High sensitivity for low Open Area (OA), 0.3%, and High Aspect Ratio (HAR)
No plasma or pulsed plasma? No problem!
Metrology of structures beyond line-of-sight
CopyExactly! has matured.
Equipment and Process Co-Optimization (EPCO) requires molecular level fingerprinting, profiling and matching; not just the same recipe on the same equipment.
Tightly controlled, autonomous low level process and chamber management is the new gold standard, to exactly match the transfer source with molecular precision.
Real-time process control for semiconductor applications allows CVD, ALD, Etch, ALE and chamber matching in high volume manufacturing environments. Resistant to corrosive gases, contamination, and equipped with incredibly fine sensitivity, Aston is uniquely suited for real-time process control for semiconductor applications.
The industry’s first ever quantitative, real-time miniature molecular sensor allows you to monitor incredibly minuscule traces of gas. The AMS-1000 is equipped to operate in high-pressure environments without the need for external pumps making it well suited for select semiconductor process control applications.
Real-time process control for applications repeatable, high sensitivity actionable chemically specific data. Aston is uniquely suited for dramatically better process control in one highly integrated measurement solution.
A quantitative, real-time, sensor and silicon oil protection module for lyophilization (Lyo) improves process control and contaminant detection.
Measure precise quantities of gases no matter how small to optimize industrial process control and immediately detect any harmful contaminants.
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