Enabling process control that is more efficient, affordable, accurate, and scalable.
Legacy metrology solutions for many industrial applications are costly, cumbersome, and struggle to keep up with the increasing complexity of business needs.
Atonarp’s advanced metrology platform enables in-situ chemically specific analysis, delivering accurate, real-time, high-sensitivity measurement capabilities.
Atonarp’s industrial process control solution combines a robust, easy to use, miniature mass spectrometer with our proprietary software platform to enable rapid, in-situ, quantitative gas analysis.
Offers a unique combination of real-time process control observability, with quantified, specific, up-to-the minute molecular data, with sensitivity downup to the parts per billion levels.
Plug-and-play ready, with built-in high-speed interfaces and intuitive easy to use software complete with a variety of industry standard protocol options, ensure the ability to fully integrate into any process tool or equipment control system.
An easy-to-use and compact self-contained single instrument that eliminates the need for specialized tools and technicians–all at one-third the size of legacy (GC-MS) solutions.
Atonarp’s industrial process control solution combines a robust, easy to use, miniature mass spectrometer with our proprietary software platform to enable rapid, in-situ, quantitative gas analysis.
Offers a unique combination of real-time process control observability, with quantified, specific, up-to-the minute molecular data, with sensitivity downup to the parts per billion levels.
Plug-and-play ready, with built-in high-speed interfaces and intuitive easy to use software complete with a variety of industry standard protocol options, ensure the ability to fully integrate into any process tool or equipment control system.
An easy-to-use and compact self-contained single instrument that eliminates the need for specialized tools and technicians–all at one-third the size of legacy (GC-MS) solutions.
Atonarp’s revolutionary optical spectroscopy platform for molecular diagnostics.
Real-time process control for semiconductor applications allows CVD, ALD, Etch, ALE and chamber matching in high volume manufacturing environments. Resistant to corrosive gases, contamination, and equipped with incredibly fine sensitivity, Aston is uniquely suited for real-time process control for semiconductor applications.
The industry’s first ever quantitative, real-time miniature molecular sensor allows you to monitor incredibly minuscule traces of gas. The AMS-1000 is equipped to operate in high-pressure environments without the need for external pumps making it well suited for select semiconductor process control applications.
Real-time process control for applications repeatable, high sensitivity actionable chemically specific data. Aston is uniquely suited for dramatically better process control in one highly integrated measurement solution.
A quantitative, real-time, sensor and silicon oil protection module for lyophilization (Lyo) improves process control and contaminant detection.
Measure precise quantities of gases no matter how small to optimize industrial process control and immediately detect any harmful contaminants.